Modeling of Photoelastic Constant Dependent on Arbitrary Crystal Orientation

Authors

  • Lubna Jahan Rashid Pinky Lecturer, Electrical Electronic and Engineering Department, IUBAT, Dhaka
  • Abu Naim Rakib Ahmed Lecturer, Electrical Electronic and Engineering Department, Khulna University of Engineering & Technology

DOI:

https://doi.org/10.3329/mist.v3i0.8055

Keywords:

Photoelastic constant, polycrystalline silicon, tensor rotation, crystal orientation, scanning infrared Polariscope method

Abstract

A mathematical model is proposed to determine the photoelastic constants in arbitrary crystal orientation of Zincblende crystal structure. Tensor rotation technique is applied using Euler’s rotation theorem to develop the model. The model is applicable to evaluate photoelastic constants in terms of P11-P12 and P44 in any crystal plane by controlling the rotation angle using the model. P11-P12 and P44 are calculated for Silicon crystal and found that the values of these constants are strongly dependent on crystal orientations. The outcome of this research enables us to evaluate quantitative amount of strain in polycrystalline silicon material (solar cell material) using Scanning Infrared Polariscope.

KEY WORDS - .

DOI: http://dx.doi.org/10.3329/mist.v3i0.8055

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How to Cite

Pinky, L. J. R., & Ahmed, A. N. R. (2011). Modeling of Photoelastic Constant Dependent on Arbitrary Crystal Orientation. MIST Journal: GALAXY (DHAKA), 3. https://doi.org/10.3329/mist.v3i0.8055

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